ACS Nano Magazine features HRI-US led research in the ‘In Nano’ section
In the ‘In Nano’ section of their June issue, the American Chemical Society Nano Magazine highlights our research on discovering new growth mechanisms for 2D materials that allow lithography-free patterning of single atomic layer materials
In the ‘In Nano’ section of their June issue, the American Chemical Society Nano Magazine highlights our research on discovering new growth mechanisms for 2D materials that allow lithography-free patterning of single atomic layer materials: ACS Nano v14, (6), p.6570 (2020): “Surfactant-Mediated Growth and Patterning of Atomically Thin Transition Metal Dichalcogenides” (leading author Xufan Li; Ethan Kahn, Gugang Chen, et al., corresponding author: Avetik Harutyunyan).